bstract: - The aim of this work was to use the electrophoretic deposition (EPD) technique for the deposition of nano-TiO2 layers directly on an SS316L substrate. The nano-TiO2 films were deposited on an SS316L alloy with various parameters, such as potential, time of de More
bstract: - The aim of this work was to use the electrophoretic deposition (EPD) technique for the deposition of nano-TiO2 layers directly on an SS316L substrate. The nano-TiO2 films were deposited on an SS316L alloy with various parameters, such as potential, time of deposition and annealed temperature—the optimum parameters required for the development of stable nano-TiO2 layer coating. The results obtained from the X-ray diffraction (XRD) and FESEM tests in this study showed that the TiO2 layers sintered at 400 °C were amorphous. The XRD patterns showed the anatase phase at 600 °C for 1 h. The heat treatment of TiO2 layers led to good adhesion with the SS316L alloy. The heat treatment above 500 °C led to the agglomeration of nano-TiO2 layers from 28 nm to 78 nm at 600 °C. The thickness of the nano-TiO2 coating increased with the deposition time and potential. The optimum thickness of the nano-TiO2 coating on the SS316L alloy was 50 µm at 5 min and 30 V. The increase in coating thickness with the time and potential of deposition led to problems, including increases in roughness and weak adhesion of the coating layer.
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