ZnS/glass Thinlayer in high vacuum condition and $40$ degree‎ ‎Deposition angle has been produced by resistance evaporated method ‎with $28$ nm thickness‎. ‎cabin deposition temperature ZnS layer was‎ ‎about $50C$ and substrates were kept at room temperature‎. ‎The Atomic ‎Force Microscopy (AFM) and XRD analyses are perfectly accomplished‎ ‎for this layer.‎‎‎ پرونده مقاله