Endpoint in plasma etch process using new modified w-multivariate charts and windowed regression

Subject Areas : Mathematical Optimization

Sihem Ben Zakour ¹ , Hassen Taleb ²

1 - Department of Quantitative methods, University of Tunis, Tunis, Tunisia
2 - Department of Quantitative methods, University of Carthage, Tunis, Tunisia

Received: 2020-10-05 Accepted : 2020-10-05 Published : 2017-09-01

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