Performance Optimization and Sensitivity Analysis of Junctionless FinFET with Asymmetric Doping Profile
Zahra Ahangari
1
(
Department of Electronic, Faculty of Electrical Engineering, Yadegar- e- Imam Khomeini (RAH) Shahr-e-Rey Branch, Islamic Azad University, Tehran, Iran
)
Ehsan Asadi
2
(
Graduate Student with Master Degree in Electronic Engineering,
1Department of Electronic, Faculty of Electrical Engineering, Yadegar- e- Imam Khomeini (RAH) Shahr-e-Rey Branch, Islamic Azad University, Tehran, Iran
)
Seied Ali Hosseini
3
(
Department of Electronic, Faculty of Electrical Engineering, Yadegar- e- Imam Khomeini (RAH) Shahr-e-Rey Branch, Islamic Azad University, Tehran, Iran
)
Keywords: Sensitivity analysis, Gate Workfunction, FinFET, Junctionless field effect transistor, Short channel effects,
Abstract :
In this paper, a novel junctionless fin field effect transistor (FinFET) with asymmetric doping profile along the device from source to drain (ADJFinFET) is introduced and the electrical characteristics of the device are comprehensively assessed. Unlike the conventional junctionless FinFET, ADJFinFET has lower channel doping density with respect to the adjacent source and drain regions, which provides superior electrical performance in nanoscale regime. Impact of device geometry and physical design parameters on the device performance are thoroughly investigated via calculating standard deviation over mean value of main electrical measures. The sensitivity analysis reveals that metal gate workfunction, doping density and fin width are critical design parameters that may fundamentally modify the device performance. Furthermore, 2D variation matrix of gate workfunction and channel doping density are calculated for optimizing the device performance in terms of off-state and on-state current. The results demonstrate that the proposed device establishes a promising candidate to realize the requirements of low-power high-performance integrated circuits.