In this study a 2 kJ Mather type plasma focus device was employed to deposit copper oxide (CuO) nanoscale thin film at room temperature on the glass substrate. The anode of the device was made of copper alloys. A mixture of oxygen and argon (O2+Ar) gases was used as the working gas for CuO deposition. CuO nanostructures were formed on the glass substrate by 25 shots at 9 cm above the anode and 0° angle with respect to the anode axis. According to the XRD results, the crystallite size of the CuO thin film is between 64 and 122 nm. FESEM images show that the growth nanostructures on the surface of the film are almost clusters with the average size of 80 nm. UV-Vis spectroscopy results indicate that the transmittance of the deposited CuO thin films in the UV region is very low. The bandgapenergy and refraction index of the film are 1.8 eV and 1.9, respectively. The IV diagram shows that as the applied voltage increases, the current intensity increases exponentially. Four-probe method shows that the electrical surface resistance of CuO thin film is in the range of 680 Ωcm, and their dc conductivity is about 13.2 S/m. پرونده مقاله

AbstractIn this experimental study, a 1.5-kJ plasma focus device of Mather type was employed to grow titanium aluminum nitride (TiAlN) coatings at room temperature on 316 stainless steel sub-layer. The anode of the device was made of Titanium and Aluminium. A mixture of N2 and Ar gases was used as the work gas for TiAlN deposition. TiAlN nanoparticles were formed on stainless steel with 0° of the degree with respect to the anode axis by different shots at 5 cm above the anode. X-ray diffraction results indicated the formation of the TiAlN structure on stainless steel. Scanning electron microscopy images demonstrated the approximately uniform growth of TiAlN nanoparticles on the surface. EDX analysis results showed that an increase in the number of the shots increased the deposition of TiAlN on the sub-layer. According to the atomic force microscopy images, the mean thickness of the surface increased as the shots increased in number. Microhardness test results of the thin layers showed that an increase in the number of the shots increased the hardness of the samples. پرونده مقاله