bstract: - The aim of this work was to use the electrophoretic deposition (EPD) technique for the deposition of nano-TiO2 layers directly on an SS316L substrate. The nano-TiO2 films were deposited on an SS316L alloy with various parameters, such as potential, time of deposition and annealed temperature—the optimum parameters required for the development of stable nano-TiO2 layer coating. The results obtained from the X-ray diffraction (XRD) and FESEM tests in this study showed that the TiO2 layers sintered at 400 °C were amorphous. The XRD patterns showed the anatase phase at 600 °C for 1 h. The heat treatment of TiO2 layers led to good adhesion with the SS316L alloy. The heat treatment above 500 °C led to the agglomeration of nano-TiO2 layers from 28 nm to 78 nm at 600 °C. The thickness of the nano-TiO2 coating increased with the deposition time and potential. The optimum thickness of the nano-TiO2 coating on the SS316L alloy was 50 µm at 5 min and 30 V. The increase in coating thickness with the time and potential of deposition led to problems, including increases in roughness and weak adhesion of the coating layer. پرونده مقاله