Optical imaging and magnetic field simulation of a DC circular planar magnetron sputtering discharge

محورهای موضوعی : Journal of Theoretical and Applied Physics

Ahmad Rastkar ¹ , Ali Reza Niknam ² , Mostafa Salahshoor ³

1 - Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran
2 - Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran
3 - School of Physics, Iran University of Science and Technology, Tehran, Iran

تاریخ دریافت : 1401/12/01 تاریخ پذیرش : 1402/02/20 تاریخ انتشار : 1402/06/10

کلید واژه: finite element method, Glow discharge plasma, Magnetron sputtering, magnetic field distribution,

چکیده مقاله :

In this paper, the optical images of glow discharge plasma and the finite element method simulation of the magnetic field strength in a balanced and two types of unbalanced DC circular planar magnetron sputtering sources are presented. The investigation showed that wherever the magnetic field strength is stronger, the intensity of light and the ionization are greater and consequently, the deposition is higher. The comparison of recorded optical images with the finite element simulation results of the magnetic field strength indicated the correlation between regions of high magnetic field strength and high light emission.