فهرس المقالات Omid Talati Khoei


  • المقاله

    1 - Device and Circuit Performance Simulation of a New Nano- Scaled Side Contacted Field Effect Diode Structure
    Journal of Optoelectronical Nanostructures , العدد 4 , السنة 4 , پاییز 2019
    A new side-contacted field effect diode (S-FED) structure has been
    introduced as a modified S-FED, which is composed of a diode and planar double gate
    MOSFET. In this paper, drain current of modified and conventional S-FEDs were
    investigated in on-state a أکثر
    A new side-contacted field effect diode (S-FED) structure has been
    introduced as a modified S-FED, which is composed of a diode and planar double gate
    MOSFET. In this paper, drain current of modified and conventional S-FEDs were
    investigated in on-state and off-state. For the conventional S-FED, the potential barrier
    height between the source and the channel is observed to become larger and the flow of
    injected electrons is reduced. Thus, the drain current decreases in on-state. While in offstate,
    the potential barrier height and width become smaller in conventional S-FED and
    so the drain current is greater than that of modified structure. Mixed mode simulations
    were used to determine the performance of the proposed logic gates. We compared the
    operation of modified S-FED with that of conventional S-FED. Simulated power delay
    product (PDP) of the modified S-FED-based NOR, NAND, XOR gates were found to
    be about 416fJ, 408fJ and 336fJ, respectively, compared with 906fJ, 810fJ and 705fJ
    achievable with conventional S-FED logic gates. تفاصيل المقالة