Effect of Annealing Temperatures on Structural and Morphological Properties of Copper doped Nickel Oxide Thin Films Prepared by RF Magnetron Sputtering

Subject Areas : Journal of Environmental Friendly Materials

E Feyzi ¹ (Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran)
F Hajakbari ² (Advanced Materials Engineering Research Center, Karaj Branch, Islamic Azad University, Karaj, Iran)
A Hojabri ³ (Advanced Materials Engineering Research Center, Karaj Branch, Islamic Azad University, Karaj, Iran)

Received: 2021-08-01 Accepted : 2021-11-28 Published : 2021-12-01

Keywords: Cu, FTIR, Sputtering, Thin films, Nickel oxide,

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