Effect of Annealing Temperatures on Structural and Morphological Properties of Copper doped Nickel Oxide Thin Films Prepared by RF Magnetron Sputtering

Subject Areas : Journal of Environmental Friendly Materials

E Feyzi ¹ , F Hajakbari ² , A Hojabri ³

1 - Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
2 - Advanced Materials Engineering Research Center, Karaj Branch, Islamic Azad University, Karaj, Iran
3 - Advanced Materials Engineering Research Center, Karaj Branch, Islamic Azad University, Karaj, Iran

Received: 2021-08-01 Accepted : 2021-11-28 Published : 2021-12-01

Keywords: Cu, FTIR, Sputtering, Thin films, Nickel oxide,

References:

[1] A. Muzamil, M. Z. Butt, A. Dilawar, F. Bashir and Z. H. Aftab, Ceram. Int., 46 (2020) 5039.

[2] Y. E. Firat and A. Peksoz, Electrochim. Acta, 295 (2019), 645.

[3] R. Noonuruk, W. Mekprasart and W. Pecharapa, Phys. Status Solidi, 12(6) (2015) 560.

[4] S. Kazuya, K. Sangcheol, K. Shuji and Z. Xinwei, Jpn. J. Appl. Phys., 55 (2016) 5.

[5] Y. Wang, J. Ghanbaja, P. Boulet, D. Horwat and J. F. Pierson, Acta Mater., 164 (2019) 648.

[6] L. Cao, D. Wang and R. Wang, Mater. lett., 132 (2014) 357.

[7] T. M. Roffo, S. Nozaki and K. Uchida, J. Cryst. Growth, 451 (2016) 57.

[8] K. Varun Kumar, R. Hussani, G. Hegde and A. S. Ethiraj, J. Mater. Sci. Semicond. Process., 66 (2017) 149.

[9] F. Hajakbari, M. T. Afzali and A. Hojabri, Acta Phys. Pol. A., 131(3) (2017) 417.

[10] Z. Nouri, A. Hojabri and F. Hajakbari, J. Environ. Friendly Mater., 4(8) (2020) 33.