Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

Subject Areas : Journal of Theoretical and Applied Physics

F. Hajakbari ¹ , S. Rashvand ² , A. Hojabri ³

1 - Department of Physics, Karaj Branch, Islamic Azad University
2 - Department of Physics, Karaj Branch, Islamic Azad University
3 - Department of Physics, Karaj Branch, Islamic Azad University

Accepted : 2019-12-01 Published : 2019-12-01

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