Annealing temperature effect on the properties of untreated and treated copper films with oxygen plasma

Subject Areas : Journal of Theoretical and Applied Physics

Alireza Hojabri ¹ , Fatemeh Hajakbari ² , Nasrin Soltanpoor ³ , Maryam Sadat Hedayati ⁴

1 - Department of Physics College of Basic Sciences, Karaj Branch, Islamic Azad University
2 - Department of Physics College of Basic Sciences, Karaj Branch, Islamic Azad University
3 - Department of Physics College of Basic Sciences, Karaj Branch, Islamic Azad University
4 - Department of Physics College of Basic Sciences, Karaj Branch, Islamic Azad University

Accepted : 2014-09-01 Published : 2014-09-01

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