Thermal Oxidation Times Effect on Structural and Morphological Properties of Molybdenum Oxide Thin Films Grown on Quartz Substrates

الموضوعات :

Alireza Hojabri ¹ , Fatemeh Hajakbari ² , Yalda Ghodrat ³

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تاريخ الإرسال : 17 الإثنين , ربيع الأول, 1437 تاريخ التأكيد : 17 الإثنين , ربيع الأول, 1437 تاريخ الإصدار : 18 الخميس , ذو الحجة, 1436

الکلمات المفتاحية:

ملخص المقالة :

Molybdenumoxide(α-MoO)thin filmswere prepared on quartzand silicon substrates by thermal oxidation of Mo thin films depositedusingDC magnetron sputtering method. Theinfluence of thermal oxidation times ranging from 60-240 min on the structural and morphological properties ofthe preparedfilms was investigated usingX-ray diffraction,Atomic force microscopy and Fourier transforminfrared spectroscopy. The XRD results revealed that the as depositedfilmwas amorphouswhilethoseformed at thermal oxidationtimes between 60-180 min exhibited polycrystalline orthorhombic molybdenumoxides. Thepresence of (0k0) reflections in XRD patterns indicated the layered structure of α-MoO. Also the surface morphology ofthe films isdependent on the thermal oxidation times. The FTIR spectrum confirmed the formationof MoO3 and the peakat 992.53 cm-1 implythelayered structure of α-MoO3.