Growth and characterization of TiAlN nanoparticles using low-energy plasma focus device
الموضوعات : Journal of Theoretical and Applied PhysicsHasan Anousha 1 , Eslam Ghareshabani 2
1 - Department of Physics, Faculty of Basic Sciences, Sahand University of Technology
2 - Department of Physics, Faculty of Basic Sciences, Sahand University of Technology
الکلمات المفتاحية: TiAlN, Plasma focus, Nanoparticles, XRD, SEM,
ملخص المقالة :
AbstractIn this experimental study, a 1.5-kJ plasma focus device of Mather type was employed to grow titanium aluminum nitride (TiAlN) coatings at room temperature on 316 stainless steel sub-layer. The anode of the device was made of Titanium and Aluminium. A mixture of N2 and Ar gases was used as the work gas for TiAlN deposition. TiAlN nanoparticles were formed on stainless steel with 0° of the degree with respect to the anode axis by different shots at 5 cm above the anode. X-ray diffraction results indicated the formation of the TiAlN structure on stainless steel. Scanning electron microscopy images demonstrated the approximately uniform growth of TiAlN nanoparticles on the surface. EDX analysis results showed that an increase in the number of the shots increased the deposition of TiAlN on the sub-layer. According to the atomic force microscopy images, the mean thickness of the surface increased as the shots increased in number. Microhardness test results of the thin layers showed that an increase in the number of the shots increased the hardness of the samples.
