Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device
الموضوعات : Journal of Theoretical and Applied PhysicsAmir Hoshang Ramezani 1 , Maryam Habibi 2 , Mahmood Ghoranneviss 3
1 - Department of Physics, West Tehran Branch, Islamic Azad University
2 - Plasma Physics Research Center, Science and Research Branch, Islamic Azad University
3 - Plasma Physics Research Center, Science and Research Branch, Islamic Azad University
الکلمات المفتاحية: PF device, Magnesium nitride, Thin Film, Nanostructure, Morphology,
ملخص المقالة :
AbstractIn this research, for the first time, we synthesize magnesium nitride thin films on 304-type stainless steel substrates using a Mather-type (2 kJ) plasma focus (PF) device. The films of magnesium nitride are coated with different number of focus shots (like 15, 25 and 35) at a distance of 8 cm from the anode tip and at 0° angular position with respect to the anode axis. For investigation of the structural properties and surface morphology of magnesium nitride films, we utilized the X-ray diffractometer (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) analysis, respectively. Also, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis. Furthermore, Vicker’s microhardness is used to study the mechanical properties of the deposited films. The results show that the degree of crystallinity of deposited thin films (from XRD), the average size of particles and surface roughness (from AFM), crystalline growth of structures (from SEM) and the hardness values of the films depend on the number of focus shots. The EDX analysis demonstrates the existence of the elemental composition of magnesium in the deposited samples.
