Modelling of Drain Current of MOSFET Transistor in Terms of Gate Oxide Thickness
Subject Areas : Majlesi Journal of Telecommunication DevicesMasoud Pourgholam 1 , Bahram Azizollah Ganji 2
1 - Babol Noshirvani University of Technology
2 -
Keywords: en,
Abstract :
Study on effects of changing the oxide thickness, can give us a view of the aspects of MOSFET, in field of design of the transistor elements. Changing the oxide thickness affects on both Cox and Vt. At first, in this paper, the relation between the threshold voltage and oxide thickness will be discussed. Then, the relation between the drain current and oxide thickness will be modeling. The result is a nonlinear and parabolic relationship between the drain current and oxide thickness. To ensure the authenticity of the obtained model, a MOSFET parameters, based on 5 µm CMOS technology was designed. This MOSFET was simulated with COMSOL software and obtained mathematical model analyzed with MATLAB. Finally, the data were compared, which confirmed the authenticity of the mathematical model.
[1] C. C. Hu, Modern Semiconductor Devices for Integrated Circuits, California, Berkeley: Prentice Hall, 2009.
[2] M. Zabeli, N. Caka, M. Limani and Q. Kabashi, “The impact of MOSFET’s physical parameters on its threshold voltage, ” in 6th WSEAS Int. Conf. Microelectronics, Nanoelectronics, Optoelectronics, Istanbul, Turkey, 2007.
[3] M. Koh, W. Mizubayashi, K. Iwamoto, H. Murakami, T. Ono, M. Tsuno, T. Mihara, K. Shibahara and S. Miyazaki, “Limit of Gate Oxide Thickness Scaling in MOSFETs due to Apparent Threshold Voltage Fluctuation Induced by Tunnel Leakage Current, ” IEEE Trans. on Electron Device, vol. 48, no. 2, pp. 259-264, 2001.
[4] I. Safayat-Al, “Effects of gate insulator thickness and diameter over on/off current ratio in ballistic CNTFETs, ” International Journal of Advanced Research in Electrical, Electronics and Instrumentation Engineering, vol. 2, no. 11, pp. 5424-5429, 2013.
[5] N. Gupta, “Threshold voltage modelling and gate oxide thickness effect on polycrystalline silicon thin-film transistors, ” IOP Publishing, Physica Scripta, vol. 76, pp. 628-633, 2007.
[6] S. M. Sze and K. K. Ng, Physics of Semiconductor Devices, Wiley-Interscience, 2006.